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The Dr.Althea 345 Relief Cream Mask is a clinically proven Korean sheet mask designed to instantly soothe, hydrate, and calm irritated or blemish-prone skin. Powered by a unique formula combining 3 blemish-relief ingredients (Niacinamide, Resveratrol, and Pantothenic Acid), 4 nourishing ingredients (Ceramide NP, Beta-Glucan, Sodium DNA, and Hydrolyzed Hyaluronic Acid), and 5 soothing ingredients (Tea Tree Leaf Water, Camellia Sinensis Leaf Water, Centella Asiatica Leaf Water, Sodium DNA, and Madecassoside), this mask delivers comprehensive skin recovery in a single step. Formulated with 30% Tea Tree Leaf Water and 3 Centella-derived ingredients, it rapidly calms redness while supporting skin regeneration. The high-adherence vegan cellulose sheet ensures a comfortable, close fit for optimal absorption of active ingredients. Clinically tested at the Korea Institute of Dermatological Sciences, with results showing skin hydration increased by 176.95% and redness improved by 7.47% after just one use.
Key Benefits
- Contains 3 blemish-relief ingredients — Niacinamide, Resveratrol, and Pantothenic Acid — to calm and clarify the skin
- Formulated with 4 nourishing ingredients — Ceramide NP, Beta-Glucan, Sodium DNA, and Hydrolyzed Hyaluronic Acid — to replenish and strengthen the skin barrier
- Features 5 soothing ingredients including Tea Tree Leaf Water, Centella Asiatica Leaf Water, and Madecassoside to relieve irritated skin
- Clinically proven to increase skin hydration by 176.95% after a single use
- Clinically shown to improve redness by 7.47% after a single use
- Made with a vegan cellulose sheet for superior skin adherence and better active ingredient absorption
- Instantly soothes irritated skin and delivers deep hydration
Skin Types
- All skin types
- Sensitive
- Acne-prone
Skin Concerns
- Redness
- Dryness
- Skin Irritation
- Acne
- Uneven Skin Tone
How to Use
- Cleanse and dry your face completely.
- Take the sheet mask out of the pouch and unfold it.
- Apply the sheet mask evenly over your face.
- Leave it on for 10–15 minutes.
- After removing, gently pat in the remaining essence for better absorption. Apply any leftover essence to other areas for extra hydration.
Ingredients: Aqua (Water), Tea Tree Leaf Water, Methylpropanediol, 1,2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium-Glycyrrhizate, Disodium EDTA, Panthenol, Soybean Seed Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella-Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium DNA, Nelumbo Nucifera Leaf Extract
- Use after cleansing and toning for best results — the mask adheres better to prepped skin.
- Leave on for no longer than 15 minutes to avoid reverse absorption of moisture.
- Gently pat — do not rub — the remaining essence after mask removal to maximize hydration.
- Ideal for use after sun exposure, post-procedure recovery, or whenever skin feels reactive or tight.
- Store in a cool, dry place away from direct sunlight for optimal efficacy.